| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for generating X-ray or EUV with reduced shift between a collision point of a particle beam and a target and a prescribed collision point and with improved positional stability of the particle beam with respect to the collision point with the target. SOLUTION: Each deflection unit (26, 32) for deflecting the particle beam along two perpendicular axis lines (X axis line and Y axis line) is formed as follows. Namely, a first deflection point (20) and a second deflection point (22) are located in a coaxial line with collision point (24) of the particle beam (12) and the target which is prescribed or can be prescribed. COPYRIGHT: (C)2007,JPO&INPIT |
