MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, METHOD FOR MANUFACTURING A DEVICE AND METHOD TO DESIGN AN OPTICAL SURFACE

摘要

In general, in one aspect, the invention features a microlithography projection optical system (101) that includes a plurality of elements (310-360) arranged to image radiation from an object plane (103) to an image plane (102), at least one of the elements being a reflective element that has a rotationally asymmetric surface positioned in a path of the radiation. The rotationally asymmetric surface deviates from a rotationally symmetric surface by about 10 nm or more and the optical system is a microlithography projection optical system.