FILM DEPOSITION METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a film deposition method by which a thin film having a high film quality can be manufactured with a high productivity, and also to provide a manufacturing method of a semiconductor device by which a semiconductor device having a good device characteristic can be manufactured with a high productivity. SOLUTION: The film deposition method for depositing a film on a substrate to be treated includes a first process wherein a first film is deposited by ALD method on an insulation layer formed on the substrate to be treated, and a second process wherein a second film is deposited by CVD method uninterruptedly after the first process. COPYRIGHT: (C)2007,JPO&INPIT