发明名称
摘要 <p>Disclosed is a CMP slurry, comprising a dispersion containing first particles having a primary particle diameter falling within a range of 5 nm to 50 nm and second particles having a primary particle diameter falling within a range of 50 nm to 100 nm, the concentration of the first particles in the dispersion falling within a range of 0.5 to 5% by weight, and the concentration of the second particles in the dispersion falling within a range of 0.01 to 0.1% by weight.</p>
申请公布号 JP3895949(B2) 申请公布日期 2007.03.22
申请号 JP20010218531 申请日期 2001.07.18
申请人 发明人
分类号 H01L21/304;B24B37/00;C09G1/02;C09K3/14;H01L21/321 主分类号 H01L21/304
代理机构 代理人
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