发明名称 ELECTRON BEAM SOURCE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam source which gives an electron beam irradiation treatment while exhausting a gas evolved inside a long object to be irradiated due to electron beam irradiation when the object whose cross-sectional contour is shaped like an endless ring is irradiated with an electron beam while being conveyed in a flat condition. SOLUTION: The electron beam source 10 has guiding members 31 and 32 which are put on the upstream and downstream sides respectively in a region irradiated with an electron beam to extend the long object W to be irradiated in a flat condition and convey it to an electron beam irradiation chamber 2 equipped with a main body 1 of the electron beam source 10 and the region irradiated with an electron beam inside the chamber 2. The source 10 has a gas exhausting device 4 for exhausting the gas G evolved due to electron beam irradiation in the object W to be irradiated. The gas exhausting device 4 pushes out the gas G into the object W to be irradiated on the further upstream side from the guiding member 31 by wiping the object W with wiping members 41 up to the second position P2 from the first position P1 between both guiding members 31 and 32 toward the guiding member 31 on the upstream side to exhaust the gas G. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007071552(A) 申请公布日期 2007.03.22
申请号 JP20050255592 申请日期 2005.09.02
申请人 NHV CORPORATION 发明人 YASHIRO YOSHIFUMI
分类号 G21K5/04;B05C9/14;C08J7/00;G21K5/00;G21K5/10 主分类号 G21K5/04
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