发明名称 |
Silicon based substrate with hafnium containing barrier layer |
摘要 |
An article comprising a substrate containing silicon and a barrier layer which functions as an environmental barrier coating and, more particularly, a barrier layer which comprises hafnium silicate and, optionally, zirconium silicate and a method for forming the hafnium silicate as a barrier coating.
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申请公布号 |
US2007065672(A1) |
申请公布日期 |
2007.03.22 |
申请号 |
US20050230196 |
申请日期 |
2005.09.19 |
申请人 |
UNITED TECHNOLOGIES CORPORATION |
发明人 |
BHATIA TANIA;SMEGGIL JOHN G.;TREDWAY WILLIAM K.;SCHMIDT WAYDE R.;NARDONE VINCENT C. |
分类号 |
B32B13/04;B05D1/08;B05D3/02;B32B9/00;B32B19/00 |
主分类号 |
B32B13/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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