发明名称 Semiconductor integrated circuit device with protection capability for protection circuits from static electrical charge
摘要 A diode is formed by an N+ diffusion layer and a P-type semiconductor substrate. In an N-well, a diode is formed by a P+ diffusion layer and an N+ diffusion layer. The N+ diffusion layer is connected to power supply wiring. A fuse is connected to the N+ diffusion layer and the P+ diffusion layer.
申请公布号 US2007063203(A1) 申请公布日期 2007.03.22
申请号 US20060520643 申请日期 2006.09.14
申请人 ELPIDA MEMORY, INC. 发明人 HAYASHIDA YOKO
分类号 H01L21/82;H01L21/822;H01L27/04;H01L27/06;H01L27/15;H01L29/18;H01L29/267;H01L31/12 主分类号 H01L21/82
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