PATTERN FILM-FORMING SUBSTRATE, MANUFACTURING METHOD OF PATTERN FILM FORMING SUBSTRATE, ELECTROOPTICAL DEVICE, AND ELECTRONIC EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a pattern film-forming substrate capable of being easily formed so that the thickness of banks is nearly uniform, to provide a manufacturing method of the pattern film-forming substrate, to provide an electrooptical device, and to provide electronic equipment.

SOLUTION: The manufacturing method of a color filter-forming substrate 1 comprises: a bank layer formation process (Fig. 3(a)) in which a nearly uniform bank layer is formed by applying liquid material as material for banks 3 over nearly the whole region on a substrate 2; a solvent discharging process (Fig. 3(b)) in which the banks 3 is formed by discharging the solvent 8 for dissolving the bank layer 3a toward parts to be made unnecessary among the whole region on which the bank layer 3a is formed; and a drying process (Fig. 3(c)) of drying the banks 3.

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