发明名称 PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus of which the treatment efficiency is improved by more effective and short-time destaticization, in a sample table provided with two or more electrodes to be arranged within a dielectric film. SOLUTION: The plasma treatment apparatus is provided with two electrodes which are arranged within a dielectric film and are respectively applied with voltage to attract a sample onto the dielectric film, and a high-frequency power supply which is placed inside a sample table to supply high-frequency electric power. While the high frequency electric power is being applied to the sample table; voltage is applied to each of the two electrodes to form a positive polarity on one electrode and a negative polarity on the other polarity, and then the sample is held on the sample table, so as to be treated by plasma produced in a processing chamber above the sample table. In this case, the two electrodes are nearly the same as each other, and, after the treatment of the sample, electric power is given to the two electrodes to form a negative polarity on one electrode a positive polarity on the other electrode. The electric power for making one electrode negative is larger than that for making the other electrode positive. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007073568(A) 申请公布日期 2007.03.22
申请号 JP20050255804 申请日期 2005.09.05
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KITADA HIROO;KARASHIMA YOSUKE;FURUSE MUNEO;SUGANO SEIICHIRO
分类号 H01L21/3065;C23C16/458;H01L21/683 主分类号 H01L21/3065
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