发明名称 METHOD AND APPARATUS FOR PLASMA TREATMENT OF POROUS MATERIAL
摘要 <p>A method for plasma treatment of a porous material comprising the steps of generating plasma using an inert gas or a mixed gas of the inert gas and a reactive gas, and performing any one of the following procedures (a) to (c) to achieve the plasma treatment of the surface and the inside of a pore of the porous material: (a) spraying the resulting plasma gas onto the porous material at a flow rate of 0.002 to 2 L/min/cm&lt;SUP&gt;2&lt;/SUP&gt; per unit area of the porous material; (b) sucking the porous material under the atmosphere of the plasma gas; or (c) sucking the porous material while spraying the plasma gas onto the porous material at a flow rate as mentioned above.</p>
申请公布号 WO2007032321(A1) 申请公布日期 2007.03.22
申请号 WO2006JP318004 申请日期 2006.09.11
申请人 TONEN CHEMICAL CORPORATION;KONO, KOICHI;KIMISHIMA, KOTARO;KISO, KAZUKI 发明人 KONO, KOICHI;KIMISHIMA, KOTARO;KISO, KAZUKI
分类号 H05H1/46;B01D67/00;B01J19/08 主分类号 H05H1/46
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