METHOD AND APPARATUS FOR PLASMA TREATMENT OF POROUS MATERIAL
摘要
<p>A method for plasma treatment of a porous material comprising the steps of generating plasma using an inert gas or a mixed gas of the inert gas and a reactive gas, and performing any one of the following procedures (a) to (c) to achieve the plasma treatment of the surface and the inside of a pore of the porous material: (a) spraying the resulting plasma gas onto the porous material at a flow rate of 0.002 to 2 L/min/cm<SUP>2</SUP> per unit area of the porous material; (b) sucking the porous material under the atmosphere of the plasma gas; or (c) sucking the porous material while spraying the plasma gas onto the porous material at a flow rate as mentioned above.</p>
申请公布号
WO2007032321(A1)
申请公布日期
2007.03.22
申请号
WO2006JP318004
申请日期
2006.09.11
申请人
TONEN CHEMICAL CORPORATION;KONO, KOICHI;KIMISHIMA, KOTARO;KISO, KAZUKI