A CHEMICAL VAPOR DEPOSITION APPARATUS,申请号KR20000025821-传众专利搜索

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发明名称	A CHEMICAL VAPOR DEPOSITION APPARATUS
摘要
申请公布号	KR100697267(B1)	申请公布日期	2007.03.21
申请号	KR20000025821	申请日期	2000.05.15
申请人		发明人
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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