Gas distribution apparatus for semiconductor processing and method of processing a substrate,申请号KR20017016763-传众专利搜索

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发明名称	Gas distribution apparatus for semiconductor processing and method of processing a substrate
摘要
申请公布号	KR100697158(B1)	申请公布日期	2007.03.21
申请号	KR20017016763	申请日期	2001.12.28
申请人		发明人
分类号	C23C16/44	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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