| 摘要 |
<p>A stepper for a wafer exposure and an exposing method using the same are provided to perform an I-line exposure process and a DUV exposure process in one stepper by arranging selectively a first and second polarization filters between a light source and a wafer. A stepper for a wafer exposure includes a light source, a first polarization filter and a second polarization filter. The light source(110) generates a wideband light including a first and second wavelengths. The first polarization filter(121) transmits the first wavelength component alone of the wideband light. The second polarization filter(122) transmits the second wavelength component alone of the wideband light.</p> |
