发明名称 |
Method for thermal development of a photosensitive element using a development medium having a support |
摘要 |
This invention relates to a method for thermally developing a photosensitive element to form a relief pattern. The method includes heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium under tension to the element to absorb the liquefied composition. The development medium includes an absorbent material and a support, the combination of which minimizes stretch and distortion of the absorbent material and can impede the migration of the liquefied composition through the absorbent material.
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申请公布号 |
EP1764654(A1) |
申请公布日期 |
2007.03.21 |
申请号 |
EP20060017610 |
申请日期 |
2006.08.24 |
申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
DUDEK, DIETMAR;HACKLER, MARK A.;MCMILLEN, ROBERT A.;BANKE, ALLAN |
分类号 |
G03F7/36;B41C1/10 |
主分类号 |
G03F7/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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