发明名称 |
Positive resist composition and method of forming resist pattern using the same. |
摘要 |
A positive resist composition comprising: (A) a fluorine atom-containing resin, wherein the resin comprises at least one group that increases a solubility of the resin in an alkali developer by the action of an acid; and (B) a sulfonium salt compound having a cation moiety, wherein the cation moiety contains at least one hydroxy group, and the sulfonium salt compound generates an acid upon irradiation with one of an actinic ray and a radiation.
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申请公布号 |
US7192685(B2) |
申请公布日期 |
2007.03.20 |
申请号 |
US20040806451 |
申请日期 |
2004.03.23 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA KUNIHIKO |
分类号 |
G03F7/004;C08F2/50;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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