发明名称 Apparatus for manufacturing flat panel display devices
摘要 A mechanism for always measuring the spatial intensity distribution of a laser beam and displacement of the optical axis of the laser beam is provided so that a measured signal is processed when the laser beam incident on a laser beam shaping optical element is out of a predetermined condition. The shape, diameter and incidence position of the laser beam incident on the laser beam shaping optical element are always kept in the predetermined condition by a spatial filter disposed at the position of a focal point of lenses forming a beam expander disposed in the optical axis, on the basis of a result of the signal processing. In this manner, silicon thin films uniform in crystallinity can be formed stably with a high yield on an insulating substrate which forms display panels of flat panel display devices.
申请公布号 US7193693(B2) 申请公布日期 2007.03.20
申请号 US20040991482 申请日期 2004.11.19
申请人 HITACHI DISPLAYS, LTD. 发明人 YAZAKI AKIO;HONGO MIKIO;HATANO MUTSUKO;NODA TAKESHI
分类号 G01N21/00;G02F1/1345;B23K26/00;B23K26/06;B23K26/073;B23K26/42;G01J1/00;G02F1/136;G02F1/1368;G09G3/36;G09G3/38;H01L21/00;H01L21/20;H01L21/268;H01L21/324;H01L21/336;H01L21/84;H01L29/786 主分类号 G01N21/00
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