发明名称 Method for generating gas plasma
摘要 A method for generating a plasma. A gas flows along a flow path having the displacement identical to the lines of magnetic force of the main magnetic field, and high frequency alternating current is applied to the gas, thereby generating a gas plasma. For example, a gas is flowed through a pipe in a first direction. Electricity is conducted through the pipe in substantially the first direction. And a magnetic field is applied along a second direction (e.g., perpendicular to the first direction) to the gas flowing in the pipe such that a plasma is induced in the pipe.
申请公布号 US7193369(B2) 申请公布日期 2007.03.20
申请号 US20030368344 申请日期 2003.02.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 MIN YOUNG-MIN;CHOI DAE-KYU;BAE DO-IN;YANG YUN-SIK;HWANG WAN-GOO;KIM JIN-MAN
分类号 H01J7/24;H01L21/3065;H01J37/32;H01L21/311;H05H1/30 主分类号 H01J7/24
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