发明名称 |
Method for generating gas plasma |
摘要 |
A method for generating a plasma. A gas flows along a flow path having the displacement identical to the lines of magnetic force of the main magnetic field, and high frequency alternating current is applied to the gas, thereby generating a gas plasma. For example, a gas is flowed through a pipe in a first direction. Electricity is conducted through the pipe in substantially the first direction. And a magnetic field is applied along a second direction (e.g., perpendicular to the first direction) to the gas flowing in the pipe such that a plasma is induced in the pipe.
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申请公布号 |
US7193369(B2) |
申请公布日期 |
2007.03.20 |
申请号 |
US20030368344 |
申请日期 |
2003.02.20 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
MIN YOUNG-MIN;CHOI DAE-KYU;BAE DO-IN;YANG YUN-SIK;HWANG WAN-GOO;KIM JIN-MAN |
分类号 |
H01J7/24;H01L21/3065;H01J37/32;H01L21/311;H05H1/30 |
主分类号 |
H01J7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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