发明名称 |
LITHOGRAPHY PROCESS OPTIMIZATION AND SYSTEM |
摘要 |
The first and second example embodiments are Pattern Fidelity Optimization Procedures for a Multiple Exposure Scheme. In the third example embodiment, the aperatures from the multiple exposure system can be combined into a single aperture by adding the apertures and modulating the relative transmission thru the respective apertures to match the prescribed dose split determined in above in the first embodiment. |
申请公布号 |
SG130090(A1) |
申请公布日期 |
2007.03.20 |
申请号 |
SG20060044630 |
申请日期 |
2006.07.03 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CROUSE MICHAEL MATTHEW;YUDHISTIRA YASRI |
分类号 |
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主分类号 |
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代理机构 |
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代理人 |
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主权项 |
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地址 |
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