| 发明名称 |
Method of plasma doping |
| 摘要 |
A method of plasma doping in which dilution of B<SUB>2</SUB>H<SUB>6 </SUB>is maximized for enhanced safety and stable plasma generation and sustention can be carried out without lowering of doping efficiency and in which the amount of dopant injected can be easily controlled. In particular, a method of plasma doping characterized in that B<SUB>2</SUB>H<SUB>6 </SUB>gas is used as a material containing doping impurity while He is used as a substance of high dissociation energy and that the concentration of B<SUB>2</SUB>H<SUB>6 </SUB>in mixed gas is less than 0.05%.
|
| 申请公布号 |
US7192854(B2) |
申请公布日期 |
2007.03.20 |
| 申请号 |
US20050532768 |
申请日期 |
2005.04.27 |
| 申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
SASAKI YUICHIRO;MIZUNO BUNJI;NAKAYAMA ICHIRO;KANADA HISATAKA;OKUMURA TOMOHIRO |
| 分类号 |
H01L21/265;H01L21/42;H01L21/223;H01L21/26 |
主分类号 |
H01L21/265 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
