| 摘要 |
FIELD: electronic industry; quantum electronics and microelectronics; methods of production of the coatings out of the metals. ^ SUBSTANCE: the invention is pertaining to the quantum electronics and may be used for production of the mirror protective coatings for the components of the lasers, and also in the microelectronics. The technical result of the invention consists in the increased coefficient of reflection and the purity of the coatings at saving the high adhesion strength and the resistance against the mechanical actions. The method of production of the coatings out of the metals, predominantly for the optical components of the lasers consists in the mass-transfer of the source compounds, their thermal gas-phase deposition into the metal and the organic products, decomposion and deposition of the metal on the heated wafer with the simultaneous withdrawal from the reaction area of the organic products of the decomposition. As the source compounds use 4-iminopentane-2-oxides of nickel, cobalt and copper, or trifluoro-4--iminopentane-2-oxides of nickel, cobalt and copper. Before the mass-transfer of the source compounds exercise the mixing of the stream of the noble gas with the stream of hydrogen up to the hydrogen contents in the mixed gas stream makes 30~90 volumetric percents. The mass-transfer is exercised by the commixed gas stream heated up to the temperature of 170-190°. The deposition of the metal is conducted at the temperature of the wafer of 230-250°. ^ EFFECT: the invention ensures the increased coefficient of reflection and purity of the coatings at saving the high adhesion strength and the resistance against the mechanical actions. ^ 1 dwg |
