发明名称 Photocurable Semiconductor Nanocrystal, Photocurable Composition for Pattern Formation of Semiconductor Nanocrystal and Method of Patterning Nanocrystal using the same
摘要 <p>Semiconductor nanocrystals surface-coordinated with a compound containing a photosensitive functional group, a photosensitive composition comprising semiconductor nanocrystals, and a method for forming semiconductor nanocrystal pattern by producing a film using the photosensitive semiconductor nanocrystals or the photosensitive composition, exposing the film to light and developing the exposed film, are provided. The semiconductor nanocrystal pattern exhibits luminescence characteristics comparable to the semiconductor nanocrystals before patterning and can be usefully applied to organic-inorganic hybrid electroluminescent devices.</p>
申请公布号 KR100697511(B1) 申请公布日期 2007.03.20
申请号 KR20030073338 申请日期 2003.10.21
申请人 发明人
分类号 G03F7/00;G03F7/004;B82Y20/00;G03F7/027;H01L21/027;H01L21/20;H01L21/36;H01L31/036;H01L35/24;H01L51/00;H01L51/46;H05B33/14 主分类号 G03F7/00
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