发明名称 Systems and methods for monitoring or controlling the ratio of hydrogen to water vapor in heat metal treating atmospheres
摘要 Systems and methods for monitoring a heat treating atmosphere derive from at least one sensor placed in situ in the atmosphere a process variable, which is indicative of the ratio of gaseous hydrogen H<SUB>2 </SUB>(g) to water vapor H<SUB>2</SUB>O (g) in the atmosphere. The systems and methods use the process variable, e.g., to control the atmosphere, or to record or display the process variable.
申请公布号 US7193189(B2) 申请公布日期 2007.03.20
申请号 US20040858274 申请日期 2004.06.01
申请人 发明人
分类号 H05B1/02;F27D7/06;F27D19/00;F27D21/00 主分类号 H05B1/02
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