发明名称 Deposition apparatus
摘要 A deposition apparatus is provided to be distinctly aligned between a substrate and a mask by increasing an adhesion force between the substrate and the mask. A deposition apparatus includes a chamber(110), a mask assembly(130), and a magnet unit(140). The mask assembly(130) includes a mask(131) and a mask frame(135). The mask(131) is arranged to deposit a substrate(120) inserted into the chamber(110). The mask frame(135) supports the mask(131). The magnet unit(140) is arranged to closely adhere the mask assembly(130) to the substrate(120) by a magnetic force. The magnet unit(140) includes a first magnet unit(141), and a second magnet unit(142). The first magnet unit(141) is arranged to be corresponded to the mask(131). The second magnet unit is arranged corresponding to the mask frame. A magnetic force of the second magnet unit is larger than that of the first magnet unit.
申请公布号 KR100696554(B1) 申请公布日期 2007.03.19
申请号 KR20050124378 申请日期 2005.12.16
申请人 发明人
分类号 H05B33/10;C23C14/12 主分类号 H05B33/10
代理机构 代理人
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