| 摘要 |
<p>A positive resist composition comprises:
(A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom;
(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation,
(C) a silicon atom-containing resin having at least one group selected from groups (X) to (Z),
(X) an alkali-soluble group,
(Y) a group capable of decomposing by action of an alkali developer to increase the solubility of resin (C) in an alkali developer,
(Z) a group capable of decomposing by action of an acid to increase the solubility of resin
(C) in an alkali developer; and
(D) a solvent.</p> |
