| 摘要 |
A novel gadolinium oxide precursor material is provided to be thermally stable and have increased volatility, thereby forming a good quality gadolinium oxide film. The gadolinium oxide precursor material is represented by the formula(1), Gd[N(Si(CH3)3)2]x[O-A-N(R^3)-B-NR^1R^2]_3-x, and is prepared by reacting a compound represented by the formula(5), Gd[N(Si(CH3)3)2]3, obtained by reacting a gadolinium compound represented by the formula(3), GdCl3, with an alkali metal salt compound represented by the formula(4), M[N(Si(CH3)3)2], with an alcohol compound represented by the formula(6), HO-A-N(R^3)-B-NR^1R^2, where M is Li, Na, or K, A is C2-5 alkylene, B is C1-4 alkylene, the A and B is able to be further substituted by at least one linear or branched C1-5 alkyl, each R^1, R^2 and R^ is independently H or linear or branched C1-5 alkyl, and x is an 0 or 1.
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