发明名称 VACUUM TREATMENT SYSTEM AND METHOD FOR CONTROLLING PRESSURE OF VACUUM TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment system capable of realizing pressure control of a plurality of vacuum vessels with a simple construction and a method for controlling a pressure of the vacuum treatment system. SOLUTION: The vacuum treatment system comprises a plurality of vacuum vessels 1, gas supply paths for supplying a gas for pressure control into the respective vacuum vessels 1, a pressure control gas supplying apparatus 12 for supplying the gas for pressure control into the respective vacuum vessels 1 through the gas supply paths, gas discharge paths branched from the respective gas supply paths to be disposed, a vacuum evacuation pump 10 capable of discharging a gas through the respective gas discharge paths, and switching valves 5, 6 capable of switching a gas flow path so as to introduce a gas from the pressure control gas supplying apparatus 12 into either one of the respective vacuum vessels 1 or the respective gas discharge paths. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007061711(A) 申请公布日期 2007.03.15
申请号 JP20050249824 申请日期 2005.08.30
申请人 SHARP CORP 发明人 TOMOYOSHI TSUTOMU
分类号 B01J3/00;B01J3/02 主分类号 B01J3/00
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