| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a liquid crystal device which does not cause a line defect, a liquid crystal device, and an electronic apparatus thereof. SOLUTION: Since etching is conducted in a state that, in a foundation layer 34, a region 36 along the region where a scan line 33 is formed is covered with a resist mask, the area in the foundation layer 34 which overlaps planarly with the scan line 33 is not scraped off. This can prevent the foundation layer 34 beneath the scan line 33 from getting thin, thereby avoiding a line defect such as wire breakage. It is not necessary to conduct etching a plurality of times when a pad part 35 is formed, and a necessary pattern can be formed by one-time etching, thereby shortening the manufacturing process. COPYRIGHT: (C)2007,JPO&INPIT |
