| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for depositing an organic thin film capable of depositing an organic thin film of high quality without causing unintended side reaction, and to provide an optical CVD (Chemical Vapor Deposition) system. SOLUTION: A raw material monomer 21 and a photosensitizer 22 are fed to a film deposition chamber 11 whose pressure is reduced to a prescribed vacuum degree, and the polymerization reaction of the raw material monomer 21 is caused via the photosensitizer 22 excited by the light of a light source 15, thus the polymerized film is deposited on a substrate W. Since the light source 15 is arranged so as to face only to an introduction flow passage 26 for the photosensitizer 22, the light of the light source 15 is not emitted to the raw material monomer 21 and the substrate W in the film deposition chamber. In this way, the generation of unintended side reaction (cutting reaction and cross-linking reaction) by the light irradiation of the light source 15 on the raw material monomer 21 or the high polymer film on the substrate W can be effectively prevented, and an organic thin film, e.g., with a three-dimensional structure can be deposited at high quality and high precision. COPYRIGHT: (C)2007,JPO&INPIT
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