| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing an inorganic material film excellent in gas barrier, having such mechanical strength and flexibility that it is made usable as a self-supported film, and uniform in thickness, and to provide such an inorganic material film. <P>SOLUTION: The method for producing the inorganic material film comprises: a step (A) of obtaining slurry by mixing an inorganic material and a liquid medium and pulverizing the inorganic material; and a step (B) of forming a film by removing the liquid medium from the slurry, wherein the dispersed inorganic material in the slurry obtained at the step (A) has a volume average diameter (D<SB>4</SB>) of 0.001-1 μm and a volume average diameter (D<SB>4</SB>) to length average diameter (D<SB>2</SB>) ratio D<SB>4</SB>/D<SB>2</SB>of 1-20. The inorganic material film obtained by the method is also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
