| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an additive for a polishing composition capable of achieving stable polishing characteristics. <P>SOLUTION: The additive for a polishing composition is added to a polishing composition (slurry) which was used at least once. This additive is an aqueous solution of one or a plurality of amine compounds, wherein the amine compound comprises a quaternary ammonium salt. Highly alkaline tetramethylammonium hydroxide (TMAH) is particularly preferred as the quaternary ammonium salt. When an amine compound is contained in the polishing composition in advance, the same amine compound as contained in the polishing composition is preferably contained. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
