发明名称 ORGANIC VAPOR DEPOSITION SOURCE AND METHOD FOR CONTROLLING HEAT SOURCE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an organic vapor deposition source which prevents a vaporizing substance from being solidified at a nozzle by minimizing a period of time necessary for a deposition rate to be stabilized and enhancing the efficiency of vapor deposition, and to provide a method for controlling a heat source. SOLUTION: The organic vapor deposition source 100 has: a crucible 10 which is arranged in a deposition chamber and evaporates an organic substance accommodated therein; a heating section 30 which includes the heating source for supplying heat to the crucible 10; a housing 50 for shielding heat radiated from a heating section 30; an external wall 70 for safely accommodating the crucible 10 therein; and a nozzle section 90 for spouting a substance evaporated from the crucible 10. The heating section 30 comprises: an upper heating part and a lower heating part which are placed in the upper part and the lower part of the crucible 10 respectively; and a first power source for supplying an electric power to the upper heating part and a second power source for supplying an electric power to the lower heating part. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007063664(A) 申请公布日期 2007.03.15
申请号 JP20060198618 申请日期 2006.07.20
申请人 SAMSUNG SDI CO LTD 发明人 JEONG MIN JAE;KIM DOKON;JEONG SEOK-HEON
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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