Polishing pad conditioning device e.g. diamond conditioning device, for e.g. chemically mechanical polishing device, has elastic part deformed with proximity of sharp end of part with polish pad to condition pad by scraping off pad surface

摘要

The device (30) has a clamping section (32) for clamping a base end of a deformed or moved or elastic part (31). The elastic part is elastically deformed with contact of proximity of a sharp end of the elastic part with a polish pad (20), so that a pad conditioning of the pad by scraping off a surface of the pad is carried out by the proximity of the sharp end of the elastic part. The elastic part is pressed on against the surface of the polish pad with a preset pad cushioning pressure, where the part is a brush-like material that is made of stainless steel, duralumin and brass. Independent claims are also included for the following: (1) a polishing device including a pad conditioning device (2) a pad conditioning method for dressing a surface of a polish pad that is utilized in a polishing device for polishing a workpiece (3) a pad manufacturing method for conditioning a surface of a polish pad (4) a pad manufacturing device for conditioning a surface of a polish pad.