发明名称 EXPOSURE DEVICE AND METHOD FOR MANUFACTURING MICRO DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device capable of efficiently cleaning the inside of a groove part formed in a substrate holding member. <P>SOLUTION: The exposure device exposing a photosensitive substrate with a prescribed pattern through a projection optical system is provided with: a substrate stage PH which holds a substrate P and has a recessed part (groove part) 50 on a holding surface for holding the substrate P along a prescribed direction; a cleaning device 30 cleaning the inside of the recessed part formed on the substrate stage PH; and a driving device relatively moving the cleaning device 30 and the substrate stage PH so that the cleaning device 30 is moved along the prescribed direction with respect to the recessed part 50. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007065527(A) 申请公布日期 2007.03.15
申请号 JP20050254358 申请日期 2005.09.02
申请人 NIKON CORP 发明人 MUKAI MIKITO;SHIRASU HIROSHI;OKAWA TOMOYUKI
分类号 G03F7/20 主分类号 G03F7/20
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