| 摘要 |
PROBLEM TO BE SOLVED: To adjust a beam focusing angle on a material side, that is, to adjust beam current density by changing the strength of an irradiation lens, while satisfying a condition that an exposure area of a shaping aperture board does not move in the case of blanking and a position in the optical axial direction of an image of an optical source does not move, in a charged particle beam exposure device and a method of adjusting the charged particle beam exposure device. SOLUTION: There are provided multiple step lenses 19 to 21 arranged at an optical source 4 side from a shaping aperture board 3 to which a charged particle beam 1 is irradiated; multiple step blankers 14, 15; an adjusting means for adjusting a principle plane position and an image side focal point position by changing lens strength and ratios of the multiple step lenses 19 to 21, while selecting interlocking ratios of the multiple step blankers 14, 15; and a blanking means for deflecting the charged particle beam 1 by the multiple step blankers 14, 15 to carry out blanking in a state of adjusting a deviation fulcrum to the position of the shaping aperture board. COPYRIGHT: (C)2007,JPO&INPIT
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