PHOTOMASK AND METHOD FOR FORMING A NON-ORTHOGONAL FEATURE ON THE SAME
摘要
A photomask and method for forming a non-orthogonal feature on the photomask are provided. A method for forming a non-orthogonal feature on a photomask blank includes providing a mask pattern file including a primitive shape and fracturing the primitive shape into a plurality of writeable shapes. A non-orthogonal feature formed by the writeable shapes is formed on a photomask blank by using a lithography system to image the writeable shapes from the mask pattern file onto a resist layer of the photomask blank.
申请公布号
WO2007030528(A2)
申请公布日期
2007.03.15
申请号
WO2006US34698
申请日期
2006.09.06
申请人
TOPPAN PHOTOMASKS, INC.;MACDONALD, SUSAN, S.;MELLENTHIN, DAVID