发明名称 ANALYSIS METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE
摘要 <p>An analysis method has a step (SA60) for developing a substrate, a first measuring step (SA50) for measuring an abnormality of the substrate before it is developed, a second measuring step (SA70) for measuring an abnormality of the substrate developed, and a step (SA80) for analyzing, based on the measurement results of the first measuring step (SA50) and the second measuring step (SA70), an exposure failure of the substrate exposed through liquid.</p>
申请公布号 WO2007029828(A1) 申请公布日期 2007.03.15
申请号 WO2006JP317901 申请日期 2006.09.08
申请人 NAKANO, KATSUSHI;NIKON CORPORATION 发明人 NAKANO, KATSUSHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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