发明名称 METHOD FOR MANUFACTURING LINEAR CARBON MATERIAL AND METHOD FOR MANUFACTURING FUNCTIONAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a linear carbon material and a functional device, by which low temperature PECVD (plasma-enhanced chemical vapor deposition) can be carried out and inexpensive manufacture using a glass substrate or the like can be carried out. <P>SOLUTION: The method for manufacturing a linear carbon material to grow a linear carbon material such as a SWCNT (single-walled carbon nanotube) by using a catalyst and producing plasma of a source gas (such as CH<SB>4</SB>) comprising a compound containing carbon includes a first step (procedure 4) of generating plasma of a reducing gas (such as H<SB>2</SB>) and treating the catalyst with the plasma and a second step (procedure 5) of generating plasma of the source gas to grow the linear carbon material. When carrying out the PECVD reaction in the source gas plasma, the catalyst surface is treated with the reducing gas plasma prior to generation of the source gas plasma so as to maintain the catalytic activity in a high state. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007063034(A) 申请公布日期 2007.03.15
申请号 JP20050248263 申请日期 2005.08.29
申请人 SONY CORP 发明人 MARUYAMA RYUICHIRO;KO KOKIN;NODA KAZUHIRO;IWAI TOSHINORI
分类号 C01B31/02;B01J23/74;B01J37/18;B01J37/34;H01L21/336;H01L29/786;H01M4/88 主分类号 C01B31/02
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