| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition capable of satisfying no pattern collapse, less scum, larger EL and better profile which enabled coexistence in high order dimension, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition, with respect to a positive resist composition for use in a process of producing a semiconductor such as IC, in production of a circuit board of a liquid crystal, a thermal head or the like, and in another photofabrication process, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition. <P>SOLUTION: The positive resist composition comprises (A) a resin having a specific repeating unit and having solubility in an alkali developer increased by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a solvent. The pattern forming method using the positive resist composition and the compound for use in the positive resist composition are also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
