| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize a resist composition having dry etching resistance, that is less likely to cause collapse of a resist pattern, capable of preventing acid leaching, and is superior in basic properties as a resist. <P>SOLUTION: The resist composition contains a polymer, having at least one kind of repeating unit derived from an acrylic ester derivative or the like and having an acid dissociable group which increases the solubility with respect to alkali developer by the action of an acid, and a crosslinking agent or a crosslinking initiator. The polymer, having the acid dissociable group, is a compound containing an oxygen-containing monocyclic derivative or a sulfur-containing cyclic derivative inside a molecule. <P>COPYRIGHT: (C)2007,JPO&INPIT |
