RESIST COMPOSITION AND METHOD OF RESIST PATTERN FORMATION

摘要

A resist composition and method of resist pattern formation, by which a resist pattern can be formed with good mask reproducibility. There is provided a resist composition comprising (A) resist component whose alkali solubility is changed by acid action and (B) acid generator component capable of acid generation when exposed to light, wherein the acid generator component (B) contains an onium salt (B0) having an anion moiety of the general formula: R<SUP>o</SUP>SO<SUB>3</SUB>