发明名称 MENUFACTURING METHOD OF SPUTTERING TARGET USING TOOTH ASH POWDER AND SURFACE REFORM METHOD OF DENTAL IMPLANT USING THE SAME
摘要 A manufacturing method of sputtering target using tooth ash powder and a surface reform method of dental implant using the same are provided to reduce dental treatment time by improving assimilability with bones and biocompatibility. The manufacturing method of sputtering target using tooth ash powder includes the steps of: manufacturing a compaction body with a crushing device from a pulled out tooth; and making a sputtering target by burning the compacted tooth. The surface reform method of dental implant using sputtering target using tooth ash powder includes the steps of making a sputtering target by using a pulled out tooth, and applying tooth ash powder on the surface of a dental implant by using a sputtering deposition method.
申请公布号 KR20070029912(A) 申请公布日期 2007.03.15
申请号 KR20050084548 申请日期 2005.09.12
申请人 CHUNSUN UNIVERSITY CO., LTD. 发明人 CHOE, HAN CHEOL;KO, YEONG MU
分类号 A61C13/00;A61C13/02;A61L27/28 主分类号 A61C13/00
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