| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photocurable composition which has high sensitivity and high solubility, suppresses occurrence of residue on development, reduces image thickening, and allows reproduction of a desired image pattern. <P>SOLUTION: The photocurable composition contains an alkali-soluble resin, a photopolymerizable compound, a trihalomethane triazine compound and a coumarin-based ultraviolet absorber, wherein at least one of the alkali-soluble resin and the photopolymerizable compound has an alkylene oxide chain. <P>COPYRIGHT: (C)2007,JPO&INPIT |
