发明名称 SAMPLE INSPECTION DEVICE, SAMPLE INSPECTION METHOD AND PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a sample inspection method for performing the inspection of a sample reducing a false flaw, and a sample inspection device. <P>SOLUTION: The sample inspection device is equipped with an optical image acquiring part 150 for acquiring the measuring data of the sample to be inspected having a pattern formed thereto, a developing circuit 111 for generating first plan image data on the basis of the first plan pattern serving as the base of the formation of the pattern of the sample to be inspected and a comparing circuit 108 for comparing the measuring data with the first plan image data. In the comparing circuit 108, the second plan image data generated on the basis of the second plan pattern is inputted to perform the comparison of the second plan image data and the measuring data in place of the first plan image data. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007064842(A) 申请公布日期 2007.03.15
申请号 JP20050252617 申请日期 2005.08.31
申请人 ADVANCED MASK INSPECTION TECHNOLOGY KK 发明人 ISOMURA IKUNAO
分类号 G01N21/956;G01B11/24;G03F1/36;G03F1/84;H01L21/027;H01L21/66 主分类号 G01N21/956
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