| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a printing plate to achieve a fine pattern by minimizing a variation of etching CD (critical dimension). <P>SOLUTION: The method includes steps of: successively forming a second etching stopper 68 and a third photoresist 69 on the entire surface of an insulating substrate 61 including a second trench; exposing the entire surface of the third photoresist 69 to light using a hard mask 62a as a mask and developing for patterning; forming a third trench 70 to a third depth larger than a second depth in the insulating substrate 61 using the hard mask 62a as a mask; and removing the hard mask 62a, the first and second etching stoppers 65, 68 and a second and the third photoresists 66, 69. <P>COPYRIGHT: (C)2007,JPO&INPIT |
