发明名称 POLISHING MACHINE, WORKPIECE SUPPORTING TABLE PAD, POLISHING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 A pedestal pad (workpiece supporting table pad) is arranged on the top of a pedestal (workpiece supporting table) for temporarily placing and holding a pre-polished or post-polished wafer (workpiece). This pedestal pad is formed of resin, and at least a surface of the pedestal pad which comes into contact with the wafer is non-absorbable to a fluid. The tissue of the pedestal pad is dense and smooth, and does not have any cavity, such as fine holes, which holds the fluid.
申请公布号 US2007060024(A1) 申请公布日期 2007.03.15
申请号 US20050320073 申请日期 2005.12.29
申请人 FUJITSU LIMITED 发明人 SHIRASU TETSUYA;AOYAMA KATSUHIKO;AKABOSHI FUMIHIKO;GOTOH KUNICHIROU
分类号 B24B7/30;B24B29/00 主分类号 B24B7/30
代理机构 代理人
主权项
地址