发明名称 |
GROUP III/V NITRIDE SEMICONDUCTOR, PHOTOCATALYST SEMICONDUCTOR ELEMENT, PHOTOCATALYTIC REDOX REACTION APPARATUS, AND PHOTOELECTROCHEMICAL REACTION EXECUTION METHOD |
摘要 |
<p>This invention provides a group III/V nitride semiconductor, which causes a redox reaction with high phototransformation efficiency upon light irradiation, a photocatalyst semiconductor element, a photocatalytic redox reaction apparatus, and a photoelectrochemical reaction execution method. The group III/V nitride semiconductor is characterized in that the full width at half maximum of an X-ray rocking curve for the catalytic reaction face is not more than 400 arcsec and the carrier concentration in a surface layer part having the catalytic reaction face is not less than 1.5 × 10<SUP>16</SUP> cm<SUP>-3</SUP> and not more than 3.0 × 10<SUP>18</SUP> cm<SUP>-3</SUP>. The photocatalyst semiconductor element is characterized in that the above group III/V nitride semiconductor is stacked on a substrate. The photocatalytic redox reaction apparatus is characterized in that one of a pair of electrolysis electrodes which are in contact with an electrolysis solution for electrical connection to each other is formed of the above group III/V nitride semiconductor, and, upon exposure of light to the catalytic reaction face constituting the group III/V nitride semiconductor, an oxidation reaction or a reduction reaction takes place in the catalytic reaction face.</p> |
申请公布号 |
WO2007029744(A1) |
申请公布日期 |
2007.03.15 |
申请号 |
WO2006JP317661 |
申请日期 |
2006.09.06 |
申请人 |
JAPAN SCIENCE AND TECHNOLOGY AGENCY;TOKYO UNIVERSITY OF SCIENCE EDUCATIONAL FOUNDATION ADMINISTRATIVE ORGANIZATION;FUJII, KATSUSHI;OHKAWA, KAZUHIRO;ONO, MASATO;ITO, TAKASHI |
发明人 |
FUJII, KATSUSHI;OHKAWA, KAZUHIRO;ONO, MASATO;ITO, TAKASHI |
分类号 |
B01J27/24;B01J35/02;C01B21/06;C30B29/38;H01L21/205 |
主分类号 |
B01J27/24 |
代理机构 |
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