发明名称 GROUP III/V NITRIDE SEMICONDUCTOR, PHOTOCATALYST SEMICONDUCTOR ELEMENT, PHOTOCATALYTIC REDOX REACTION APPARATUS, AND PHOTOELECTROCHEMICAL REACTION EXECUTION METHOD
摘要 <p>This invention provides a group III/V nitride semiconductor, which causes a redox reaction with high phototransformation efficiency upon light irradiation, a photocatalyst semiconductor element, a photocatalytic redox reaction apparatus, and a photoelectrochemical reaction execution method. The group III/V nitride semiconductor is characterized in that the full width at half maximum of an X-ray rocking curve for the catalytic reaction face is not more than 400 arcsec and the carrier concentration in a surface layer part having the catalytic reaction face is not less than 1.5 × 10&lt;SUP&gt;16&lt;/SUP&gt; cm&lt;SUP&gt;-3&lt;/SUP&gt; and not more than 3.0 × 10&lt;SUP&gt;18&lt;/SUP&gt; cm&lt;SUP&gt;-3&lt;/SUP&gt;. The photocatalyst semiconductor element is characterized in that the above group III/V nitride semiconductor is stacked on a substrate. The photocatalytic redox reaction apparatus is characterized in that one of a pair of electrolysis electrodes which are in contact with an electrolysis solution for electrical connection to each other is formed of the above group III/V nitride semiconductor, and, upon exposure of light to the catalytic reaction face constituting the group III/V nitride semiconductor, an oxidation reaction or a reduction reaction takes place in the catalytic reaction face.</p>
申请公布号 WO2007029744(A1) 申请公布日期 2007.03.15
申请号 WO2006JP317661 申请日期 2006.09.06
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY;TOKYO UNIVERSITY OF SCIENCE EDUCATIONAL FOUNDATION ADMINISTRATIVE ORGANIZATION;FUJII, KATSUSHI;OHKAWA, KAZUHIRO;ONO, MASATO;ITO, TAKASHI 发明人 FUJII, KATSUSHI;OHKAWA, KAZUHIRO;ONO, MASATO;ITO, TAKASHI
分类号 B01J27/24;B01J35/02;C01B21/06;C30B29/38;H01L21/205 主分类号 B01J27/24
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