| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize a resist composition having high transparency with respect to far-ultraviolet rays and radiation and moreover, superior in basic properties as a resist, such as sensitivity, resolution, dry etching resistance, pattern shape and line edge roughness. <P>SOLUTION: The resist composition contains a polymer having at least one kind of repeating unit derived from an acrylic ester derivative or the like and having an acid dissociable group which increases the solubility with respect to alkali developer, and an acid generator capable of generating an acid upon irradiation with light or radiation. The polymer has an absorbance at 193 nm of ≤1.0 (l/μm) and degree of dispersion of ≤1.4. <P>COPYRIGHT: (C)2007,JPO&INPIT |
