SEMICONDUCTOR DEVICE AND METHOD OF ITS DEFECT INSPECTION

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device and a method of its defect inspection which can detect short defect easily and promptly, and are useful for a countermeasure of micro scratch causing the short defect. SOLUTION: The semiconductor device has a test pattern 16 inspected on a picture formed by charged particle beam. The device is formed by alternatively arranging a first segment conductor pattern 14 electrically connected and second segment conductor pattern 13 electrically not connected to the above-mentioned semiconductor substrate 11 or lower layer interconnect line on an upper-most insulating film 12 on the semiconductor substrate 11. COPYRIGHT: (C)2007,JPO&INPIT