| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of creating an efficient inspection recipe for inspecting a plurality of inspection regions of different picture brightness by roughness and fineness of a pattern in a circuit pattern inspection of a semiconductor wafer. SOLUTION: When stripe inspection is carried out in a chip, since the combination of cell comparison regions I-VII are different in each of regions A, B, C, inspection origination/end coordinates, cell comparison pitches, inspection threshold values are registered as an inspection region information for every inspection region I-VII, the pattern inspection is carried out while changing these cell comparison pitches and inspection threshold values during scanning the stripe. COPYRIGHT: (C)2007,JPO&INPIT
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