Method of controlling impurity doping and impurity doping apparatus

摘要

Disclosed here is a method of controlling a dose amount of dopant to be doped into object ( 1 ) to be processed in plasma doping. According to the method, the doping control is formed of the following processes: determining the temperature of object ( 1 ), the amount of ions having dopant in plasma that collide with object ( 1 ), and types of gases in plasma during doping; calculating a dose amount by neutral gas according to the temperature of object ( 1 ), and a dose amount by ions from the determined amount of ions containing dopant that collide with object ( 1 ); and carrying out doping so that the sum of the dose amount by neutral gas and the dose amount by ions equal to a predetermined dose amount.